English translation for "beam lithography"
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- 射束刻蚀法
Related Translations:
- Example Sentences:
| 1. | Vector scan electron beam lithography
矢量扫描电子束光刻 | | 2. | Ion beam lithography
离子束微影术 | | 3. | This paper introduced the develop level of electron beam lithography in the world and the techniques used in pattern generators
论文首先简要介绍了国内外电子束曝光技术的发展水平和图形发生器的工作原理。 | | 4. | The most prevalent procedure is to use photolithography or electron - beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer
最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。 | | 5. | In this article we briefly introduce the e - beam lithography techniques , and we describe our experiences in the modification of an sem into an e - beam writer
以电子显微镜改装成的简易电子束曝光机在性能上虽比不上设计精良的专业化电子束曝光机，但在很多情况下可以符合研发工作的要求，可说是经济实用的方案。 | | 6. | A whole scheme of a new kind of digital pattern generator of the e - beam lithography system is given , including system function , hardware and software design
本论文介绍了扫描电子束曝光机图形发生器的总体方案、系统设计、硬件实现和软件编程等，提出了一套完整的图形发生器硬件方案，并完成了图形发生器接口的设计。 | | 7. | Although the creation of a finely detailed bas - relief master is expensive because it requires electron - beam lithography or other advanced techniques , copying the pattern on pdms stamps is cheap and easy
虽然得花上大笔金钱，才能以电子束蚀刻或其他高阶技术制作出有精密细节的浅浮雕主片，但要复制pdms压模的图案却是便宜又容易。 | | 8. | At present , feas have potential for use as an electron source in a wide variety of applications , including microwave power amplifiers ( such as twts , klystron ) , flat panel displays , electron microscopy , and electron beam lithography
目前,场致发射阵列阴极的应用领域十分广泛,主要包括微波器件(应用于twts , klystron等) 、平板显示器( feds ) 、电子显微镜及电子束刻蚀系统等。其中,应用研究的焦点主要集中在平板显示器和射频功率放大器。 | | 9. | By studying and using conventional 1c process in combination with electron beam lithography ( ebl ) , reactive ion etching ( rie ) and lift - off process , several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires , si quantum dots , double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes
研究利用常规的硅集成电路工艺技术结合电子束光刻，反应离子刻蚀和剥离等技术制备半导体和金属纳米结构，很好地解决了普通光刻与电子束光刻的匹配问题，提高了加工效率，经过多次的工艺实验，摸索出一套制备纳米结构的工艺方法，首次用电子束光刻，反应离子刻蚀和剥离等技术制备出了多种纳米结构(硅量子线、量子点，双量子点和三叉指状的金属栅结构) 。 | | 10. | Abstract : a new method for determining proximity parameters , , and in electron - beam lithography is introduced on the assumption that the point exposure spread function is composed of two gaussians . a single line is used as test pattern to determine proximity effect parameters and the normalization approach is adopted in experimental data transaction in order to eliminate the need of measuring exposure clearing dose of the resist . furthermore , the parameters acquired by this method are successfully used for proximity effect correction in electron - beam lithography on the same experimental conditions
文摘:在电子散射能量沉积为双高斯分布的前提下,提出了一种提取电子束光刻中电子散射参数,和的新方法.该方法使用单线条作为测试图形.为了避免测定光刻胶的显影阈值,在实验数据处理中使用归一化方法.此外,用此方法提取的电子散射参数被成功地用于相同实验条件下的电子束临近效应校正 |
- Similar Words：
- "beam limiter diode" English translation, "beam limiting aperture" English translation, "beam limiting device" English translation, "beam limiting system" English translation, "beam line" English translation, "beam litter" English translation, "beam litting mirror" English translation, "beam load" English translation, "beam loading" English translation, "beam loading coefficient" English translation
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